Exposure apparatus and device manufacturing method

Photocopying – Projection printing and copying cameras – Step and repeat

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C355S072000

Reexamination Certificate

active

07630056

ABSTRACT:
An exposure apparatus that exposes a substrate via liquid includes a substrate stage configured to hold the substrate and to move. The substrate stage includes a top plate, a substrate holder disposed on the top plate and configured to hold the substrate, and a support-plate holder disposed on the top plate as a separate body from the substrate holder and configured to hold a support plate while surrounding the substrate held by the substrate holder. The substrate holder includes an extension having a surface facing a back surface of the support plate held by the support-plate holder. The support-plate holder is provided with a collecting port therein through which liquid that has entered a gap between the back surface of the support plate and the surface of the extension is collected.

REFERENCES:
patent: 7199858 (2007-04-01), Lof et al.
patent: 7349064 (2008-03-01), Nakano
patent: 2007/0109521 (2007-05-01), Nishii et al.
patent: 2007/0146666 (2007-06-01), Leenders et al.
patent: 2007/0269294 (2007-11-01), Nagasaka et al.
patent: 2008/0271747 (2008-11-01), De Jong et al.
patent: 2004-289127 (2004-10-01), None
patent: 2006-074061 (2006-03-01), None
patent: 2006-310588 (2006-11-01), None
patent: 2007-194613 (2007-08-01), None
patent: 2005/059977 (2005-06-01), None
patent: 2006/030908 (2006-03-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Exposure apparatus and device manufacturing method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure apparatus and device manufacturing method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure apparatus and device manufacturing method will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4055648

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.