Exposure apparatus and device manufacturing method

Details Exposure apparatus and device manufacturing method Exposure apparatus and device manufacturing method

2007-10-23

2008-11-25

Nguyen, Hung Henry (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S053000

Reexamination Certificate

active

07456934

ABSTRACT:
An exposure apparatus configured to expose a substrate via a reticle includes a light source emitting light, a measuring device performing measurement of a wavelength spectrum of the light emitted from the light source, and a controller. The controller calculates a central wavelength of the light emitted from the light source based on the wavelength spectrum measured by the measuring device, calculates a difference between the calculated central wavelength and a central wavelength set to the light source for the measurement, and updates the central wavelength to be set to the light source based on the calculated difference.

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