Exposure apparatus and device manufacturing method

Details Exposure apparatus and device manufacturing method Exposure apparatus and device manufacturing method

2007-10-03

2008-12-09

Mathews, Alan A (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S072000, C355S075000

Reexamination Certificate

active

07463334

ABSTRACT:
An exposure apparatus is disclosed. The exposure apparatus has a projection optical system, aligns a reticle and a substrate and projects a pattern of the reticle to the substrate via the projection optical system to expose the substrate to light. The apparatus comprises a measuring device configured to perform measurement for the alignment, a first support configured to support the measuring device; and a second support configured to support the projection optical system. The first support and the second support are isolated from each other.

REFERENCES:
patent: 5187519 (1993-02-01), Takabayashi et al.
patent: 5909272 (1999-06-01), Osanai et al.
patent: 6493062 (2002-12-01), Tokuda et al.
patent: 6538720 (2003-03-01), Galburt et al.
patent: 11-297587 (1999-10-01), None

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