Exposure apparatus and device manufacturing method

Details Exposure apparatus and device manufacturing method Exposure apparatus and device manufacturing method

2006-03-24

2008-09-09

Kim, Peter B (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S030000

Reexamination Certificate

active

07423724

ABSTRACT:
An exposure apparatus exposes a substrate to light via a reticle in a vacuum. A projection optical system projects a pattern of the reticle onto the substrate, a stage holds the substrate and moves, and first and second partitions define an exhaust space between a first space accommodating at least a part of the projection optical system and a stage space accommodating the stage. The first partition includes a first opening to make the light pass between the first space and the exhaust space, and the second partition includes a second opening to make the light pass between the exhaust space and the stage space. A first supply system supplies fluid into the stage space, and a first exhaust system recovers fluid from the stage space through the second opening and the exhaust space. A pressure in the exhaust space is lower than those in the first space and the stage space.

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