Exposure apparatus and device manufacturing method

Details Exposure apparatus and device manufacturing method Exposure apparatus and device manufacturing method

2004-11-05

2008-01-08

Mathews, Alan (Department: 2851)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C355S053000, C355S077000

Reexamination Certificate

active

07317505

ABSTRACT:
An exposure apparatus having a projection optical system and configured to expose a substrate to light via a pattern of a mask and the projection optical system. The apparatus includes a chamber to hermetically contain at least part of the projection optical system, and a circulating system to send an inert gas to the chamber. A controller controls a temperature regulator on the basis of a target temperature in the chamber and a detection result of a temperature sensor. The controller changes the target temperature so that a timewise temperature gradient of the inert gas falls within an acceptable range. The acceptable range is determined so that a timewise change in pressure in the chamber caused by a timewise change in temperature of the inert gas is within an acceptable range.

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