Exposure apparatus and device manufacturing method

Details Exposure apparatus and device manufacturing method Exposure apparatus and device manufacturing method

2004-12-08

2008-01-01

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C355S053000

Reexamination Certificate

active

07315347

ABSTRACT:
An exposure apparatus includes a light source, an illumination optical system for illuminating an original with light from the light source, and a projection optical system for projecting a pattern of the original, illuminated by the illumination optical system, onto a substrate. In addition, a radiation member is disposed opposite to a subject of temperature adjustment which corresponds to at least one of an optical element of the illumination optical system, an optical element of the projection optical system and the original, and a control system controls a temperature of the radiation member in accordance with a state or exposure of the subject of temperature adjustment.

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