Exposure apparatus and device manufacturing method

Photocopying – Projection printing and copying cameras – Step and repeat

Reexamination Certificate

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Details

C355S030000, C355S075000

Reexamination Certificate

active

11285604

ABSTRACT:
The exposure system comprises a projection optical system that irradiates exposure light emitted from a mask onto a substrate, a first support member that supports the projection optical system, and a support structure that supports the first support member, wherein the support member supports the first support member at a position that is higher than the position at which the first support member supports the projection optical system.

REFERENCES:
patent: 5155523 (1992-10-01), Hara et al.
patent: 5172160 (1992-12-01), Van Eijk et al.
patent: 5559329 (1996-09-01), Joseph et al.
patent: 5691806 (1997-11-01), Tokuda et al.
patent: 5781277 (1998-07-01), Iwamoto
patent: 5822133 (1998-10-01), Mizuno et al.
patent: 6151105 (2000-11-01), Lee
patent: 6330052 (2001-12-01), Yonekawa et al.
patent: 6396566 (2002-05-01), Ebinuma et al.
patent: 6741332 (2004-05-01), Nishi
patent: 6774981 (2004-08-01), Watson et al.
patent: 6791644 (2004-09-01), Toda
patent: 6853443 (2005-02-01), Nishi
patent: 2001/0017890 (2001-08-01), Rhee
patent: 2002/0017890 (2002-02-01), Ebihara et al.
patent: 2002/0044269 (2002-04-01), Yonekawa et al.
patent: 2002/0048003 (2002-04-01), Haney et al.
patent: 2002/0080339 (2002-06-01), Takahashi
patent: 2002/0102481 (2002-08-01), Lee et al.
patent: 2002/0163631 (2002-11-01), Sogard
patent: 2003/0030779 (2003-02-01), Hara
patent: 2004/0156026 (2004-08-01), Kamiya
patent: A-03-214721 (1991-09-01), None
patent: A-05-121294 (1993-05-01), None
patent: A-09-106944 (1997-04-01), None
patent: A-11-307438 (1999-11-01), None
patent: A-2000-269118 (2000-09-01), None
patent: A 2002-305140 (2002-10-01), None
patent: A-2003-068623 (2003-03-01), None
patent: A-2003-120747 (2003-04-01), None

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