Exposure apparatus and device manufacturing method

Photocopying – Projection printing and copying cameras – With temperature or foreign particle control

Reexamination Certificate

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Details

C355S053000, C359S820000

Reexamination Certificate

active

11387683

ABSTRACT:
An exposure apparatus which exposes a pattern of an original onto a substrate. The apparatus includes an optical system, including a reflective optical element, configured to conduct exposure light, a cooling mechanism configured to cool the reflective optical element included in the optical system, a detection unit configured to detect cooling information of the cooling mechanism and to produce a detection result, and a determination unit configured to determine optical characteristics of the reflective optical element, based on the detection result of the detection unit and a previously stored correlation between optical characteristics of the reflective optical element and the cooling information of the cooling mechanism.

REFERENCES:
patent: 6501533 (2002-12-01), Murata
patent: 6891175 (2005-05-01), Hiura
patent: 6992306 (2006-01-01), Honda et al.
patent: 7006194 (2006-02-01), Sumiyoshi et al.
patent: 7068348 (2006-06-01), Hara
patent: 7116501 (2006-10-01), Sakamoto
patent: 2005/0073663 (2005-04-01), Miyajima
patent: 2006/0214118 (2006-09-01), Hiura
patent: 2001-143992 (2001-05-01), None
patent: 2004-193468 (2004-07-01), None

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