Exposure apparatus, and device manufacturing method

Details Exposure apparatus, and device manufacturing method Exposure apparatus, and device manufacturing method

2007-10-16

2007-10-16

Mathews, Alan (Department: 2851)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C355S053000

Reexamination Certificate

active

11226339

ABSTRACT:
An apparatus for exposing a wafer with light. The apparatus includes a chamber for enclosing at least a portion of a path of the light, a circulation system having a fan unit, an inactive gas supplying path from the fan unit to the chamber, and an inactive gas return unit from the chamber to the fan unit, in which the circulation system is arranged to circulate an inactive gas through the chamber, and a control unit for controlling the fan unit. The control unit changes a revolution speed of the fan unit so that the gas pressure inside the chamber is held within a tolerance. A pressure loss at the return path is smaller than a positive pressure being set with respect to a gas pressure inside the chamber.

REFERENCES:
patent: 5892572 (1999-04-01), Nishi
patent: 6633364 (2003-10-01), Hayashi
patent: 6987554 (2006-01-01), Nomoto
patent: 2001/0055326 (2001-12-01), Miwa et al.
patent: 2002/0024645 (2002-02-01), Nakano
patent: 2005/0110968 (2005-05-01), Aichi et al.
patent: 2006/0176455 (2006-08-01), Nomoto
patent: 2002-324750 (2002-11-01), None

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