Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing
Reexamination Certificate
2007-06-19
2007-06-19
Picard, Leo (Department: 2125)
Data processing: generic control systems or specific application
Specific application, apparatus or process
Product assembly or manufacturing
C355S053000
Reexamination Certificate
active
10969072
ABSTRACT:
An exposure apparatus for exposing a subject to a pattern. The apparatus includes an update system to update a parameter necessary for processing in the exposure apparatus through measurement, a setting system to set a validity period of the parameter updated by the update system, and a control system to cause the update system to perform an update based on the validity period. Prior to execution of a unit of the processing, the control system determines whether the update by the update system is to be performed, based on a predicted completion time of the unit and the validity period.
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Japanese Office Action dated Oct. 24, 2005, issued in corresponding Japanese patent application No. 2003-364955, with English translation.
Canon Kabushiki Kaisha
Fitzpatrick ,Cella, Harper & Scinto
Garland Steven R.
Picard Leo
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