Exposure apparatus and device manufacturing method

Photocopying – Projection printing and copying cameras – With temperature or foreign particle control

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C355S053000, C355S067000, C378S034000, C378S035000, C250S492100

Reexamination Certificate

active

10988514

ABSTRACT:
Disclosed is an exposure apparatus including a projection optical system for projecting a pattern of an original onto a substrate, a stage for holding the substrate, a cover for substantially surrounding an exposure light path, from an end portion of the projection optical system, at a side facing the stage, to the stage, a first supply port provided inside the cover, for supplying a purge gas into a space surrounded by the cover, and a first exhaust port provided in an end portion of said cover at a side facing the stage, for exhausting the gas.

REFERENCES:
patent: 5997963 (1999-12-01), Davison et al.
patent: 6542220 (2003-04-01), Schrijver et al.
patent: 6555834 (2003-04-01), Loopstra
patent: 6665046 (2003-12-01), Nogawa et al.
patent: 6731371 (2004-05-01), Shiraishi
patent: 2002/0018190 (2002-02-01), Nogawa et al.
patent: 2003/0006380 (2003-01-01), Van Empel et al.
patent: 2003/0146396 (2003-08-01), Loopstra
patent: 2005/0030496 (2005-02-01), Chibana et al.
patent: 2006/0012765 (2006-01-01), Kameyama
patent: 2006/0114435 (2006-06-01), Hazelton et al.
patent: 2006/0164615 (2006-07-01), Hirukawa
patent: 2001-210587 (2001-08-01), None
patent: 2001-358056 (2001-12-01), None
patent: 2002-513856 (2002-05-01), None
patent: 2003-53892 (2003-02-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Exposure apparatus and device manufacturing method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure apparatus and device manufacturing method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure apparatus and device manufacturing method will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3788199

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.