Exposure apparatus and device manufacturing method

Details Exposure apparatus and device manufacturing method Exposure apparatus and device manufacturing method

2007-03-20

2007-03-20

Rutledge, D. (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C414S221000, C250S492200

Reexamination Certificate

active

11019112

ABSTRACT:
An exposure apparatus for exposing a substrate. The apparatus includes an optical system being set at a reference temperature, for directing light to the substrate, an exposure chamber for storing the optical system in a vacuum ambience, and a load-lock chamber, disposed adjacent to the exposure chamber, for converting an ambience of a space surrounding the substrate into a vacuum ambience. When the load-lock chamber converts the ambience of the space surrounding the substrate into a vacuum ambience, the temperature of the load-lock chamber is made higher than the reference temperature.

REFERENCES:
patent: 5223113 (1993-06-01), Kaneko et al.
patent: 5914493 (1999-06-01), Morita et al.
patent: 6071350 (2000-06-01), Jeon et al.
patent: 6107212 (2000-08-01), Fujita
patent: 6388263 (2002-05-01), Song
patent: 6468918 (2002-10-01), Kuo
patent: 2005/0118002 (2005-06-01), Kasumi
patent: 2005/0277031 (2005-12-01), Yan
patent: 2003-234282 (2003-08-01), None
patent: 2003229348 (2003-08-01), None

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