Exposure apparatus and device manufacturing method

Photocopying – Projection printing and copying cameras – Illumination systems or details

Reexamination Certificate

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Details

C355S053000, C355S077000, C359S290000, C359S291000, C359S855000

Reexamination Certificate

active

11237486

ABSTRACT:
An exposure apparatus includes a beam splitter for splitting light from a light source into first and second beams, a spatial light modulator, arranged in an optical path for the first beam, for modulating a phase distribution of the first beam, a beam coupler for coupling the first beam with the second beam, a projection optical system for projecting a pattern of the spatial light modulator onto a substrate using light from the beam coupler, and a controller for supplying a modulation signal to the spatial light modulator, wherein the spatial light modulator has a one-dimensionally or two-dimensionally arranged pixels, each pixel has plural reflective elements, and the reflective elements in the same pixel displace in the same direction simultaneously.

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patent: 6133986 (2000-10-01), Johnson
patent: 6285488 (2001-09-01), Sandstrom
patent: 6-102459 (1994-04-01), None
Born and Wolf, Principles of Optics; 6thedition (Cambridge University Press, Cambridge, 1999), pp. 306-314.
A. K. Wong, Attenuating Phase Shifting Mask, Resolution Enhancement Techniques in Optical Lithograph (SPIE, Bellingham 2001), pp. 139-151.
D. Malacara, Optical Shop Testing (John Wiley &Sons, 1992), Chapter 3, Common-Path Inteferometers, S. Mallick, pp. 95-122.
D. Malacara, Optical Shop Testing (John Wiley &Sons, 1992), Chapter 4, Lateral Shearing Interferometers, M. Mantravadi, pp. 123-171.

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