Exposure apparatus and device manufacturing method

Photocopying – Projection printing and copying cameras – With temperature or foreign particle control

Reexamination Certificate

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Details

C355S053000, C355S067000, C355S077000

Reexamination Certificate

active

11149532

ABSTRACT:
An exposure apparatus for projecting a pattern of an original onto a substrate using exposure light includes a projection optical system to project the pattern onto the substrate; a shielding structure, having an opening through which the exposure light passes, to shield the projection optical system from an outside environment; and an attraction system, including at least one of a panel to generate an electric field and a cryogenic panel arranged to face a path of the exposure light passing through the opening, to attract contaminants.

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patent: 6359678 (2002-03-01), Ota
patent: 6414323 (2002-07-01), Abe et al.
patent: 6459472 (2002-10-01), De Jager et al.
patent: 6614505 (2003-09-01), Koster et al.
patent: 2001/0016302 (2001-08-01), Hirayanagi et al.
patent: 2002/0041368 (2002-04-01), Ota et al.
patent: 2002/0109828 (2002-08-01), Moors et al.
patent: 2005/0128446 (2005-06-01), Miyajima
patent: 2005/0140947 (2005-06-01), Miyajima
patent: 2005/0168712 (2005-08-01), Miyajima
patent: 7-263322 (1995-10-01), None
patent: 2002-50568 (2002-02-01), None

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