Exposure apparatus, and device manufacturing method

Details Exposure apparatus, and device manufacturing method Exposure apparatus, and device manufacturing method

2006-10-31

2006-10-31

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S053000, C355S055000

Reexamination Certificate

active

07130021

ABSTRACT:
Disclosed is a scan type exposure apparatus for exposing a substrate, placed on an exposure plane, to a pattern of a mask with light from a light source. In one preferred embodiment, the apparatus includes a stop member for restricting an exposure range on the exposure plane, a measuring system for measuring an illuminance distribution which is produced on a predetermined plane displaced from the exposure plane in an optical axis direction and by a predetermined amount and which is provided by light passed through an opening of the stop member and projected or to be projected at a predetermined position on the exposure plane, and a calculating device for calculating an angular characteristic of light projected or to be projected on the exposure plane, on the basis of integrating illuminance distributions which are defined by lights incident at plural positions along a scan direction upon the exposure plane and which are measured by the measuring system.

REFERENCES:
patent: 6333777 (2001-12-01), Sato
patent: 6710856 (2004-03-01), Van Der Laan et al.
patent: 6768546 (2004-07-01), Sato
patent: 7009681 (2006-03-01), Shinoda
patent: 11-087232 (1999-03-01), None
patent: 11-087232 (1999-03-01), None

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