Exposure apparatus and device manufacturing method

Photocopying – Projection printing and copying cameras – With temperature or foreign particle control

Reexamination Certificate

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Details

C355S053000

Reexamination Certificate

active

07130016

ABSTRACT:
An exposure apparatus includes a plurality of chambers which respectively have openings and are connected to each other to be able to communicate with each other through the openings, and a suppressing system which suppresses a gas from flowing into at least one of the plurality of chambers through the openings after disconnection of the plurality of chambers. The one of the plurality of chambers has a projection, another one of the plurality of chambers has a recess, and the one chamber and the other chamber are connected to each other as the projection is fitted in the recess.

REFERENCES:
patent: 5559584 (1996-09-01), Miyaji et al.
patent: 6262794 (2001-07-01), Miyajima
patent: 6335787 (2002-01-01), Nishi
patent: 6545746 (2003-04-01), Nishi
patent: 6614504 (2003-09-01), Aoki et al.
patent: 6704088 (2004-03-01), Tanimoto
patent: 6801301 (2004-10-01), Miyajima et al.
patent: 6829038 (2004-12-01), Miwa
patent: 6842221 (2005-01-01), Shiraishi
patent: 6961114 (2005-11-01), Murayama et al.
patent: 2003/0151728 (2003-08-01), Nishi
patent: 2005/0128446 (2005-06-01), Miyajima
patent: 2005/0140947 (2005-06-01), Miyajima
patent: 2005/0219501 (2005-10-01), Sato et al.
patent: 2005/0275821 (2005-12-01), Miyajima
patent: 9-246140 (1997-09-01), None
patent: 2821795 (1998-09-01), None
patent: 2000-12412 (2000-01-01), None
patent: 2002-203771 (2002-07-01), None

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