Exposure apparatus and device manufacturing method

Details Exposure apparatus and device manufacturing method Exposure apparatus and device manufacturing method

2008-07-01

2008-07-01

Nguyen, Hung Henry (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S030000

Reexamination Certificate

active

07394522

ABSTRACT:
At least one exemplary embodiment is directed to an exposure apparatus for exposing a substrate. The exposure apparatus includes a movable substrate stage, a projection optical system configured to project light from an original and including a final optical element, and a nozzle member provided around the final optical element and including an opposing surface opposing the substrate. The substrate is exposed via liquid filled between a final surface of the projection optical system and the substrate, the projection optical system, and the original. The opposing surface includes a supply port, a first recovery port provided farther from an optical axis of the final optical element than the supply port, and a first portion and a second portion provided between the supply port and the first recovery port. The distance between the first portion and the substrate is longer than the distance between the supply port and the substrate.

REFERENCES:
patent: 2004/0160582 (2004-08-01), Lof et al.
patent: 2006/0231206 (2006-10-01), Nagasaka et al.
patent: 2006/0250593 (2006-11-01), Nishii
patent: 2007/0146663 (2007-06-01), Nagasaka
patent: 2007/0252964 (2007-11-01), Kohno et al.
patent: 2005-353820 (2005-12-01), None
patent: 99-49504 (1999-09-01), None
patent: 2005-029559 (2005-03-01), None

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