Exposure apparatus and device manufacturing method

Details Exposure apparatus and device manufacturing method Exposure apparatus and device manufacturing method

2008-06-03

2008-06-03

Mathews, Alan A (Department: 2851)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C355S053000, C355S067000, C355S075000

Reexamination Certificate

active

07382434

ABSTRACT:
An exposure apparatus includes a projection optical system for projecting a pattern of a mask onto a substrate, a holder for holding the substrate and having a first channel for the fluid to flow, and a fluid supply unit for supplying the fluid from the first channel of the holder to at least part of a space between the projection optical system and the substrate, the exposure apparatus exposing the substrate via the projection optical system and the fluid.

REFERENCES:
patent: 4509852 (1985-04-01), Tabarelli et al.
patent: 5610683 (1997-03-01), Takahashi
patent: 2003/0043352 (2003-03-01), Sudoh et al.
patent: 2005/0237501 (2005-10-01), Furukawa et al.
patent: 10-303114 (1998-11-01), None
patent: 99/49504 (1999-09-01), None
English Translation of JP 10-303114 (dated Nov. 13, 1998).

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