Exposure apparatus and device manufacturing method

Details Exposure apparatus and device manufacturing method Exposure apparatus and device manufacturing method

2011-03-29

2011-03-29

Nguyen, Hung Henry (Department: 2882)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S030000

Reexamination Certificate

active

07916273

ABSTRACT:
An exposure apparatus includes an illumination optical system for illuminating a reticle using a light from a light source, and a projection optical system for projecting a pattern of the reticle onto a substrate, the exposure apparatus exposing the substrate through a liquid that is supplied to a space between the substrate and a lens of the projection optical system closest to the substrate, a surface of the lens on which the light does not pass having a polished surface.

REFERENCES:
patent: 5825043 (1998-10-01), Suwa
patent: 7405805 (2008-07-01), Uitterdijk et al.
patent: 7545481 (2009-06-01), Streefkerk et al.
patent: 7619715 (2009-11-01), Ono et al.
patent: 2005/0024609 (2005-02-01), DeSmit et al.
patent: 2005/0110973 (2005-05-01), Streefkerk et al.
patent: 2005/0225734 (2005-10-01), De Smit et al.
patent: 2006/0203218 (2006-09-01), Shirai et al.
patent: 2006/0231206 (2006-10-01), Nagasaka et al.
patent: 2009/0180090 (2009-07-01), Hara
patent: 1 486 828 (2004-12-01), None
patent: 1 670 038 (2006-06-01), None
patent: 10-154659 (1998-06-01), None
patent: 2002-036085 (2002-02-01), None
patent: 2005-005713 (2005-01-01), None
patent: 2005-129810 (2005-05-01), None
patent: 2005-202375 (2005-07-01), None
patent: 2005-203681 (2005-07-01), None
patent: 2005-286286 (2005-10-01), None
patent: 2006-178327 (2006-07-01), None
patent: 2005/020298 (2005-03-01), None
patent: 2005/029559 (2005-03-01), None
Communication from European Patent Office including European Search Report dated Oct. 29, 2007.

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