Exposure apparatus and device manufacturing method

Details Exposure apparatus and device manufacturing method Exposure apparatus and device manufacturing method

2011-01-04

2011-01-04

Glick, Edward J (Department: 2882)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C355S053000

Reexamination Certificate

active

07864291

ABSTRACT:
An exposure apparatus, which has a projection optical system configured to project a pattern of a reticle onto a substrate, and exposes the substrate to light via the reticle and the projection optical system, with a space between the projection optical system and the substrate filled with liquid. A supply nozzle supplies liquid to the space, a supply path supplies the liquid to the supply nozzle, a bypass branches from the supply path, and a supply control valve changes a flow rate of the liquid supplied from the supply path to the supply nozzle to control the supply of the liquid to the space, and a liquid quality sensor arranged in the bypass measures a purity of the liquid. The supply of the liquid to the space is controlled based on a measurement performed by the liquid quality sensor, so that liquid having a purity satisfying a standard is supplied to the space.

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