Exposure apparatus and device manufacturing method

Details Exposure apparatus and device manufacturing method Exposure apparatus and device manufacturing method

1995-12-21

1998-12-08

McPherson, John A.

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

430397, 355 69, 355 77, G03F 720, G03B 2772

Patent

active

058466789

ABSTRACT:
An exposure apparatus for transferring, by exposure, a pattern of a mask onto a wafer, includes a pulse light source and a scanning system for relatively and scanningly moving the mask and the wafer relative to an illumination region to be defined by pulses of light to be sequentially provided by the pulse light source, wherein the number of pulses for exposure of the wafer is determined on the basis of information representing a relation between the pulse number and exposure non-uniformness, and wherein the pulse number is expressed by L/.DELTA.X where L is the width of the illumination region in a scan direction and .DELTA.X is the amount of relative displacement of the illumination region moving in the light emission interval of one pulse.

REFERENCES:
patent: 3823318 (1974-07-01), Krause
patent: 4519692 (1985-05-01), Michalik
patent: 4711568 (1987-12-01), Torigoe et al.
patent: 4804978 (1989-02-01), Tracy
patent: 4822975 (1989-04-01), Torigoe
patent: 4884101 (1989-11-01), Tanimoto
patent: 4947047 (1990-08-01), Muraki
patent: 4970546 (1990-11-01), Suzuki et al.
patent: 4974919 (1990-12-01), Muraki et al.
patent: 5053614 (1991-10-01), Yui et al.
patent: 5107275 (1992-04-01), Tsuruoka et al.
patent: 5119390 (1992-06-01), Ohmori
patent: 5171965 (1992-12-01), Suzuki et al.
patent: 5191374 (1993-03-01), Hazama et al.
patent: 5250797 (1993-10-01), Sano et al.
patent: 5475491 (1995-12-01), Shiozawa
patent: 5491534 (1996-02-01), Shiozawa
patent: 5591958 (1997-01-01), Nishi

Affiliated with

Also associated with

Rating

Exposure apparatus and device manufacturing method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure apparatus and device manufacturing method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure apparatus and device manufacturing method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-175433