Exposure apparatus and device fabrication method

Details Exposure apparatus and device fabrication method Exposure apparatus and device fabrication method

2008-04-04

2011-11-22

Kim, Peter B (Department: 2882)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S071000

Reexamination Certificate

active

08064042

ABSTRACT:
The present invention provides an exposure apparatus comprising an illumination optical system configured to illuminate a reticle with a light beam from a light source, and a projection optical system which is configured to project a pattern of the reticle onto a substrate, and has a numerical aperture of not less than 0.7, the projection optical system including an optical member on which an antireflection coating configured to suppress reflection of the light beam is formed and which is arranged closest to the substrate, wherein a reflectance of the antireflection coating with respect to the light beam is minimum at an incident angle of not less than 30°.

REFERENCES:
patent: 6574039 (2003-06-01), Murata et al.
patent: 7057820 (2006-06-01), Kawashima
patent: 2002/0191168 (2002-12-01), Ishizawa et al.
patent: 2003/0020893 (2003-01-01), Kawashima
patent: 2005/0151942 (2005-07-01), Kawashima
patent: 2005/0225737 (2005-10-01), Weissenrieder et al.
patent: 2005/0237502 (2005-10-01), Kawashima
patent: 2003-017396 (2003-01-01), None
patent: 2006-303340 (2006-11-01), None

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