Exposure apparatus and device fabrication method

Details Exposure apparatus and device fabrication method Exposure apparatus and device fabrication method

2008-07-07

2009-08-25

Nguyen, Hung Henry (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S053000

Reexamination Certificate

active

07580116

ABSTRACT:
The present invention provides an exposure apparatus including a position detection apparatus that detects at least one of a position of a reticle and a position of a substrate. The position detection apparatus includes an optical member whose position can be changed, a photoelectric conversion device that receives light from a mark and outputs a detection signal, and a control unit that controls the position of the optical member based on information on a first evaluation value representing a symmetry of a waveform of the detection signal at each of a plurality of positions of the optical member and information on a second evaluation value representing a position shift of the mark detected upon changing a position of the mark in an optical axis direction of an optical system at each of the plurality of positions of the optical member.

REFERENCES:
patent: 5654553 (1997-08-01), Kawakubo et al.
patent: 6337162 (2002-01-01), Irie
patent: 6999893 (2006-02-01), Matsumoto et al.
patent: 2003/0053057 (2003-03-01), Mishima
patent: 09-167738 (1997-06-01), None

Affiliated with

Also associated with

Rating

Exposure apparatus and device fabrication method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure apparatus and device fabrication method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure apparatus and device fabrication method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4081354