Exposure apparatus and device fabrication method

Details Exposure apparatus and device fabrication method Exposure apparatus and device fabrication method

2007-11-26

2009-02-10

Mathews, Alan A (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S053000, C355S067000

Reexamination Certificate

active

07489387

ABSTRACT:
An exposure apparatus comprising an illumination optical system configured to illuminate a reticle with a light beam from a light source, and a projection optical system configured to project a pattern image of the reticle onto a substrate, the illumination optical system including a light-shielding member which is arranged near a plane conjugate to a pupil plane of the projection optical system and which can move along an optical axis of the illumination optical system, wherein the light-shielding member is moved such that a light intensity distribution on the pupil plane of the projection optical system becomes nonuniform.

REFERENCES:
patent: 7345741 (2008-03-01), Shiozawa et al.
patent: 2003/0151730 (2003-08-01), Shinoda
patent: 2005/0024619 (2005-02-01), Shinoda et al.
patent: 2005/0270608 (2005-12-01), Shinozawa et al.
patent: 07-201697 (1995-08-01), None
patent: 2006-019702 (2006-01-01), None

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