Exposure apparatus and an exposure method using the same

Details Exposure apparatus and an exposure method using the same Exposure apparatus and an exposure method using the same

1993-07-14

1994-11-29

Wintercorn, Richard A.

Photocopying

Projection printing and copying cameras

Identifying, composing, or selecting

355 53, G03B 2752, G03B 2770, G03B 2742

Patent

active

053694643

ABSTRACT:
An exposure apparatus includes a first reflective type photomask 18a, a first mask stage 180a for mounting the first reflected type photomask 18a, a second reflective type photomask 18b, and a second mask stage 180b for mounting the second reflective type photomask 18b. Light 11a from a light source 11 is directed to the first and second reflective type photomasks 18a and 18b. The first exposure light 110c and the second exposure light 110b reflected by the first and second reflective type photomasks 18a and 18b are merged by a half mirror 30 to form a third exposure light 110e to expose a resist film 21a on a semiconductor substrate 21.

REFERENCES:
patent: 4295735 (1981-10-01), Lacombat et al.
patent: 4422753 (1983-12-01), Pryor
patent: 4769680 (1988-09-01), Resor, III et al.
patent: 4860061 (1989-08-01), Ikeda
patent: 4869998 (1989-09-01), Eccles et al.
patent: 4878086 (1989-10-01), Isohata et al.
patent: 5117254 (1992-05-01), Kawashima et al.

Affiliated with

Also associated with

Rating

Exposure apparatus and an exposure method using the same does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure apparatus and an exposure method using the same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure apparatus and an exposure method using the same will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-76917