Optics: measuring and testing – Inspection of flaws or impurities – Surface condition
Reexamination Certificate
2005-05-24
2005-05-24
Toatley, Jr., Gregory J. (Department: 2877)
Optics: measuring and testing
Inspection of flaws or impurities
Surface condition
C356S237100
Reexamination Certificate
active
06897949
ABSTRACT:
A scanning type exposure apparatus includes a projection optical system which projects a pattern of a reticle onto a wafer, which is held by a wafer chuck, a scanning stage system which scanningly moves the reticle and the wafer synchronously with respect the projection optical system, and an inspection system which automatically inspects influence of particles on at least one of the wafer and on the wafer chuck. The inspection system includes a focus detector which measures a focus state of the wafer and a calculator which calculates outputs of the focus detector.
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Canon Kabushiki Kaisha
Fitzpatrick ,Cella, Harper & Scinto
Smith Zandra V.
Toatley , Jr. Gregory J.
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