Optics: measuring and testing – Inspection of flaws or impurities – Surface condition
Reexamination Certificate
2008-03-04
2008-03-04
Nguyen, Sang H. (Department: 2886)
Optics: measuring and testing
Inspection of flaws or impurities
Surface condition
C356S394000, C356S237100
Reexamination Certificate
active
07339662
ABSTRACT:
A scanning type exposure apparatus includes a projection optical system which projects a pattern of a reticle onto a wafer, which is held by a wafer chuck, a scanning stage system which scanningly moves the reticle and the wafer synchronously with respect the projection optical system, and an inspection system which automatically inspects influence of particles on at least one of the wafer and on the wafer chuck. The inspection system includes a focus detector which measures a focus state of the wafer and a calculator which calculates outputs of the focus detector.
REFERENCES:
patent: 4849901 (1989-07-01), Shimizu
patent: 4893932 (1990-01-01), Knollenberg
patent: 5105075 (1992-04-01), Ohta et al.
patent: 5124562 (1992-06-01), Kawashima et al.
patent: 5142156 (1992-08-01), Ozawa et al.
patent: 5162867 (1992-11-01), Kohno
patent: 5218415 (1993-06-01), Kawashima
patent: 5243377 (1993-09-01), Umatate et al.
patent: 5363172 (1994-11-01), Tokuda
patent: 5448332 (1995-09-01), Sakakibara et al.
patent: 5473424 (1995-12-01), Okumura
patent: 5559582 (1996-09-01), Nishi et al.
patent: 5569930 (1996-10-01), Imai
patent: 5585918 (1996-12-01), Takeuchi et al.
patent: 5587794 (1996-12-01), Mizutani et al.
patent: 5602400 (1997-02-01), Kawashima
patent: 5602639 (1997-02-01), Kohno
patent: 5657130 (1997-08-01), Shirasu et al.
patent: 5729337 (1998-03-01), Tanaka
patent: 5737063 (1998-04-01), Miyachi
patent: 5747202 (1998-05-01), Tanaka
patent: 5751428 (1998-05-01), Kataoka et al.
patent: 5777744 (1998-07-01), Yoshii et al.
patent: 5825043 (1998-10-01), Suwa
patent: 5825468 (1998-10-01), Ishimaru
patent: 5942357 (1999-08-01), Ota
patent: 5978078 (1999-11-01), Salamati-Saradh et al.
patent: 6080517 (2000-06-01), Miyachi
patent: 6117598 (2000-09-01), Imai
patent: 6118515 (2000-09-01), Wakamoto et al.
patent: 6163369 (2000-12-01), Yamada et al.
patent: 6277533 (2001-08-01), Wakamoto et al.
patent: 6287734 (2001-09-01), Imai
patent: 6411387 (2002-06-01), Kaneko et al.
patent: 6456374 (2002-09-01), Takeishi
patent: 6894763 (2005-05-01), Murakami et al.
patent: 61-287229 (1986-12-01), None
patent: 63006511 (1988-01-01), None
patent: 1-264220 (1989-10-01), None
patent: 2-122613 (1990-05-01), None
patent: 7-37772 (1995-02-01), None
patent: 8-37150 (1996-02-01), None
patent: 9-266169 (1997-10-01), None
Canon Kabushiki Kaisha
Fitzpatrick ,Cella, Harper & Scinto
Nguyen Sang H.
LandOfFree
Exposure apparatus and a device manufacturing method using... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Exposure apparatus and a device manufacturing method using..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure apparatus and a device manufacturing method using... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2812375