Exposure apparatus

Details Exposure apparatus Exposure apparatus

2011-07-26

2011-07-26

Nguyen, Hung Henry (Department: 2882)

Photocopying

Projection printing and copying cameras

Focus or magnification control

C355S053000, C355S072000, C355S075000, C355S077000, C399S400000, C399S401000

Reexamination Certificate

active

07986396

ABSTRACT:
An exposure apparatus includes a projection optical system that projects a pattern image of an original onto a substrate, an original stage that holds and drives the original, a substrate stage that holds and drives the substrate, and a position detecting system that detects the relative positional relationship between position detection marks formed on the original or the original stage and fiducial marks formed on the substrate stage. The position detection marks form a plurality of mark groups arranged in a first direction. Each of the plurality of mark groups has a first mark for measuring the position in the first direction and a second mark for measuring the position in a second direction perpendicular to the first direction. The position detecting system has a plurality of photoelectric conversion elements, which simultaneously detect a plurality of the first marks or a plurality of the second marks.

REFERENCES:
patent: 6023320 (2000-02-01), Kawashima
patent: 6870623 (2005-03-01), Tanaka et al.
patent: 7193685 (2007-03-01), Miura
patent: 2004/0165195 (2004-08-01), Sato et al.
patent: 2005/0002035 (2005-01-01), Mishima
patent: 2005/0128453 (2005-06-01), Miura
patent: 2005/0146693 (2005-07-01), Ohsaki
patent: 2007/0052113 (2007-03-01), Marokkey et al.
patent: 2005-175400 (2005-06-01), None

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