Exposure apparatus

Details Exposure apparatus Exposure apparatus

2011-04-26

2011-04-26

Nguyen, Hung Henry (Department: 2882)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C355S053000, C355S067000

Reexamination Certificate

active

07932990

ABSTRACT:
An exposure apparatus includes a projection optical system that projects a pattern of a reticle onto a wafer, a vacuum chamber in which the projection optical system is disposed, a partition provided in the vacuum chamber and dividing a first space (which is a space where at least a portion of the projection optical system exists) and a second space (which is a space other than the first space) from each other, a gas supplying unit that supplies gas to the first space, and a sealant that reduces flow of the gas supplied through a pipe into the second space.

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patent: WO 2006075575 (2006-07-01), None

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