Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing
Reexamination Certificate
2011-01-11
2011-01-11
Decady, Albert (Department: 2121)
Data processing: generic control systems or specific application
Specific application, apparatus or process
Product assembly or manufacturing
C700S100000, C700S121000
Reexamination Certificate
active
07869893
ABSTRACT:
An exposure apparatus includes a plurality of stations and a plurality of substrate stages, and exposes a substrate to radiant energy by executing a plurality of jobs using the plurality of stations and the plurality of substrate stages. The apparatus includes a controller configured to acquire the plurality of jobs, and to determine an execution sequence of the plurality of jobs. One of the plurality of substrate stages includes a measurement unit that is different from any measurement unit included in another of the plurality of substrate stages in what to measure. The controller is configured to determine the execution sequence of the plurality of jobs based on information of respective positions of the plurality of substrate stages, information of measurement units that the plurality of substrate stages respectively have, and information of the measurement units respectively necessary for the plurality of jobs.
REFERENCES:
patent: 6282457 (2001-08-01), Miura et al.
patent: 2003/0211410 (2003-11-01), Irie
patent: 2006/0055956 (2006-03-01), Takahashi et al.
patent: 2006-269669 (2006-10-01), None
patent: 10-2003-0087575 (2003-11-01), None
Office Action issued on Apr. 24, 2009 in corresponding Korean Patent Application No. 10-2007-0122669.
Canon Kabushiki Kaisha
De'cady Albert
Garland Steven R
Rossi Kimms & McDowell LLP
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