Exposure apparatus

Details Exposure apparatus Exposure apparatus

1990-07-10

1992-03-10

Albritton, C. L.

Electric heating

Metal heating

By arc

21912174, 21912182, B23K 2602

Patent

active

050951904

ABSTRACT:
A projection exposure apparatus includes an illumination system for illuminating a mask pattern; a projection optical system for projecting the mask pattern being illuminated upon the surface of a wafer so as to expose the same to the mask pattern; a wavelength detecting device effective to detect the wavelength of a light from a light source included in the illumination system; and a control device operable, in accordance with an output signal from the wavelength detecting device, to control at least one of the projection magnification of the projection optical system and the relative position of the wafer with respect to the imaging position of the mask pattern.

REFERENCES:
patent: 4131365 (1978-12-01), Pryor
patent: 4156124 (1979-05-01), Macken et al.
patent: 4687322 (1987-08-01), Tanimoto et al.
patent: 4690528 (1987-09-01), Tanimoto et al.
patent: 4699505 (1987-10-01), Komoriya et al.
patent: 4720621 (1988-01-01), Langen
patent: 4769523 (1988-09-01), Tanimoto et al.
patent: 4773750 (1988-09-01), Bruning
patent: 4811055 (1989-03-01), Hirose

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