Exposure apparatus

Details Exposure apparatus Exposure apparatus

1985-01-14

1987-03-31

Gellner, Michael L.

Photocopying

Projection printing and copying cameras

Step and repeat

355 77, G03B 2742

Patent

active

046539034

ABSTRACT:
An exposure apparatus having a single light source and a plurality of exposure stages for carrying thereon wafers, respectively. The light emitting from the light source is directed to a plurality of masks simultaneously or sequentially, so that the patterns of the masks are simultaneously or sequentially transferred onto the wafers, respectively, carried on the exposure stages. In a preferred form, the light source comprises an excimer laser providing a pulsed laser beam.

REFERENCES:
patent: 3614225 (1971-10-01), Dinella
patent: 4132479 (1979-01-01), Dubroeucq et al.
patent: 4498742 (1985-02-01), Uehara

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