Exposure apparatus

Details Exposure apparatus Exposure apparatus

1997-05-29

1999-11-02

Mathews, Alan A.

Photocopying

Projection printing and copying cameras

Illumination systems or details

355 53, 355 67, G03B 2772, G03B 2742, H01L 2130

Patent

active

059780720

ABSTRACT:
An exposure apparatus illuminates a mask with exposure light emitted from an illumination optical system and projects a mask pattern image that is formed when the exposure light passes through the mask onto a photosensitive substrate. The illumination optical system includes an optical element for making the intensity distribution of exposure light emitted from the light source uniform, and aperture stops are interchangeably positioned directly behind the optical element. The illumination optical system additionally includes an adjusting mechanism that adjusts the positions and the inclination of the optical element and the aperture stops in the direction along the optical axis in directions perpendicular to the optical axis, and with respect to the inclination from the optical axis. Thus, the positional relationship between the optical element and the aperture stops can be kept constant, and as a result, the exposure accuracy of an exposure apparatus can be improved.

REFERENCES:
patent: 5335044 (1994-08-01), Shiraishi
patent: 5661546 (1997-08-01), Taniguchi

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