Exposure apparatus

Details Exposure apparatus Exposure apparatus

1991-04-04

1992-12-15

Evans, F. L.

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

250548, 355 53, G01B 1100

Patent

active

051721899

ABSTRACT:
An exposure apparatus includes a stage for carrying thereon a wafer; an exposure system for projecting radiation energy to the wafer to print a pattern thereon; and a detection optical system having a sigma value defined as the ratio of the diameter of an image of an aperture of a stop to the diameter of the aperture of the stop for projecting a radiation beam to the wafer and for receiving a reflection beam reflected from the wafer to detect a mark of the wafer which is defined by a level difference on the wafer, the detection optical system including an adjuster for changing the sigma value in accordance with the level difference defining the mark.

REFERENCES:
patent: 4931830 (1990-06-01), Suwa et al.
patent: 4939630 (1990-07-01), Kikuchi et al.
patent: 4943733 (1990-07-01), Mori et al.

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