Exposure apparatus

Details Exposure apparatus Exposure apparatus

1997-06-30

2000-08-15

Epps, Georgia

Optical: systems and elements

Lens

With field curvature shaping

359656, 359658, 359679, 359757, G02B 300, G02B 2102, G02B 1514, G02B 962

Patent

active

061045446

ABSTRACT:
A projection optical system of the present invention has a first lens group G.sub.1 being positive, a second lens group G.sub.2 being negative, a third lens group G.sub.3 being positive, a fourth lens group G.sub.4 being negative, a fifth lens group G.sub.5 being positive, and a sixth lens group G.sub.6 being positive in the named order from the first object toward the second object, in which the second lens group G.sub.2 comprises an intermediate lens group G.sub.2M between a negative front lens L.sub.2F and a negative rear lens L.sub.2R and in which the intermediate lens group G.sub.2M is arranged to comprise at least a first positive lens being positive, a second lens being negative, a third lens being negative, and a fourth lens being negative in the named order from the first object toward the second object. The present invention involves findings of suitable focal length ranges for the first to the sixth lens groups G.sub.1 to G.sub.6 and an optimum range of an overall focal length of from the second negative lens to the fourth lens with respect to a focal length of the second lens group G.sub.2.

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J. Braat, "Quality of Microlithographic Projection Lenses", pp. 22-30, Proceedings of SPIE vol. 811, Optical Microlithographic Technology for Integrated Circuit Farbrication and Inspection (1987).
U.S. application No. 08/152,490, refiled as U.S. application No. 08/727,206, Which was Refiled as U.S. application No. 08/929,155; Apr. 23, 1999 Which was Allowed, But No Issue Date or Patent Number.
U. S. application No. 08/255927, filed Jun. 7, 1994, Nakashima et al. patent No. 5,534,970, issue date Jul. 9, 1996.

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