Exposure apparatus

Details Exposure apparatus Exposure apparatus

1995-01-30

1996-09-24

Gellner, Michael L.

Photocopying

Projection printing and copying cameras

Detailed holder for photosensitive paper

355 53, 355 67, 355 76, G03B 2734

Patent

active

055595847

ABSTRACT:
An exposure apparatus is for illuminating a pattern on a mask by an illumination optical system to transfer the pattern on the mask onto a photosensitive substrate set on a stage through a projection optical system. The exposure apparatus comprises a first supply device for supplying an inert gas toward the photosensitive substrate substantially in parallel with the optical axis of the projection optical system in a space open to communicate with the atmosphere between the projection optical system and the photosensitive substrate, and a second supply device for supplying the inert gas to the space in a direction intersecting with the optical axis of the projection optical system so as to establish an inert gas atmosphere in the space together with the first supply device. The transfer is conducted in the inert gas atmosphere.

REFERENCES:
patent: 4564284 (1986-01-01), Tsutsui
patent: 4699505 (1987-10-01), Komoriya et al.
patent: 4716299 (1987-12-01), Tanaka et al.
patent: 4748477 (1988-05-01), Isohata et al.
patent: 4749867 (1988-06-01), Matsushita et al.
patent: 4786947 (1988-11-01), Kosugi et al.
patent: 4803524 (1989-02-01), Ohno et al.
patent: 4820930 (1989-04-01), Tsutsui et al.
patent: 4998134 (1991-03-01), Isohata et al.
patent: 4999671 (1991-03-01), Iizuka
patent: 5003342 (1991-03-01), Nishi
patent: 5025284 (1991-06-01), Komoriya et al.
patent: 5184196 (1993-02-01), Nakagawa et al.

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