Exposure apparatus

Photocopying – Projection printing and copying cameras – Identifying – composing – or selecting

Patent

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Details

355 53, 356401, G03B 2752

Patent

active

048537454

ABSTRACT:
An exposure apparatus for exposing to a substrate the image of the desired pattern of a mask having a mark and a desired pattern formed thereon. Light source for illuminating the mask by at least part of the laser light from the light source, a projection optical system, movable stage, position detecting for detecting the relative position of the stage and the mask and outputting a position signal, a fiducial member formed integrally with the stage, the fiducial member having a fiducial pattern disposed thereon. A second illuminating optical system for illuminating the fiducial pattern from the opposite side of the projection optical system with respect to the fiducial member. The second illuminating optical system having a plurality of reflecting members for directing at least part of the laser light from the light source to the fiducial pattern. Normalizing a second detection signal on the basis of a first detection signal, and processing for determining the position of the image of the mark formed on the predetermined surface by the projection optical system, on the basis of a position signal and the second normalized detection signal.

REFERENCES:
patent: 4395117 (1983-07-01), Suzuki
patent: 4629313 (1986-04-01), Tanimoto
patent: 4794426 (1988-12-01), Nishi

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