Exposure apparatus

Details Exposure apparatus Exposure apparatus

1993-04-19

1994-04-26

Lerner, Martin

Optical: systems and elements

Holographic system or element

Having optical element between object and recording medium

359 35, 359494, 359559, 359564, G03H 104, G02B 2742

Patent

active

053071840

ABSTRACT:
An exposure apparatus capable of making exposure for concentric circular periodic grating is provided with a quarter-wave plate (4), an ND filter (8a) having step-wisely different transmissions with boundaries of circle or a group of circles, an axially symmetric-shaped patterning mask (8b), an interference lens (9), before a sample substrate (10) having a photosensitive film (11). The interference lens (9) has a form of rotation symmetry with respect to optical axis (9L), and its incident surface (9P) is a flat plane, and its exit surface (9S) is a surface of revolution which is close to a circular cone.

REFERENCES:
patent: 2770166 (1956-11-01), Gabor
patent: 3610723 (1971-10-01), Spitz
patent: 4824191 (1989-04-01), Kato et al.
patent: 5081540 (1992-01-01), Dufresne et al.
patent: 5111312 (1992-05-01), Stewart
Nishihara et al., Optical Integrated Circuits, OHM Co., 1985, pp. 216-221.
Matsushita, Fundamentals And Experiments Of Holography, Kyoritsu Press Co., 1979, pp. 16 to 19.

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