Exposure apparatus

Details Exposure apparatus Exposure apparatus

1994-02-14

1996-01-23

Gellner, Michael L.

Photocopying

Projection printing and copying cameras

Illumination systems or details

355 53, G03B 2572

Patent

active

054868963

ABSTRACT:
An exposure apparatus adapted for use in manufacture of semiconductor devices or substrates for liquid crystal display panels, comprises an illumination systems for irradiating a first object with a light beam from a light source; a projection optical system for projecting the image of a pattern on the first object, illuminated by the light beam, onto a second object; and a light attenuation device provided in the illumination system and adapted to gradually decrease the amount of light in the peripheral portion of the image of the pattern, projected onto the second object, as the distance from the center of the image increases.

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patent: 5324600 (1994-06-01), Jinbo et al.
patent: 5329333 (1994-07-01), Noguchi et al.

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