Exposure apparatus

Details Exposure apparatus Exposure apparatus

1998-04-14

2000-09-12

Burke, Margaret

Optical: systems and elements

Optical modulator

Light wave directional modulation

369119, 369 4413, G02F 133, G11B 700, G11B 70037

Patent

active

061185744

ABSTRACT:
An exposure apparatus to expose a photo-sensitive layer formed on a substrate of a recording media is disclosed which comprises an exposure light source; a first means of focusing a light from the light source; an acousto-optic modulator disposed off the focal plane of the first focusing means to modulate the light focused by the first focusing means according to a signal to be recorded; and a second means of focusing the light modulated by the acousto-optic modulator onto the photo-sensitive layer formed on the substrate of the recording media.

REFERENCES:
patent: 4982398 (1991-01-01), Yamamoto et al.
patent: 5230770 (1993-07-01), Kashiwagi
patent: 5238786 (1993-08-01), Kashiwagi
International Search Report for PCT Application No. PCT/JP99/03089.

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