Exposure apparatus

Details Exposure apparatus Exposure apparatus

1996-08-29

2000-07-04

Westin, Edward P.

Optical: systems and elements

Lens

Multiple component lenses

359766, G02B 1324

Patent

active

060847239

ABSTRACT:
The present invention relates to an exposure apparatus having a high-performance projection optical system having a relatively large numerical aperture and achieving bitelecentricity and superior correction of aberrations, particularly distortion, in a very wide exposure area. Particularly, the protection optical system according to the present invention is composed of a first lens group G.sub.1 with a positive refracting power, a second lens group G.sub.2 with a negative refracting power, a third lens group G.sub.3 with a positive refracting power, a fourth lens group G.sub.4 with a negative refracting power, and a fifth lens group G.sub.5 with a positive refracting power in order from the side of a first object R. The present invention is directed to finding of suitable ranges of focal lengths for the first to fifth lens groups G.sub.1 -G.sub.5, based on the above arrangement.

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