Exposure apparatus

Details Exposure apparatus Exposure apparatus

1987-06-12

1989-02-14

Wintercorn, Richard A.

Photocopying

Projection printing and copying cameras

Illumination systems or details

355 43, 355 53, G03B 2754, G03B 2742

Patent

active

048050024

ABSTRACT:
A reduction projection exposure apparatus includes an excimer laser beam source, and a concave spherical mirror disposed in the optical path between the light source optical system and a reticle, so as to minimize the overall height of the optical system (in particular, the reduction projection exposure apparatus) and to increase the degree of freedom of optical design. The apparatus is more than 25% shorter than the conventional apparatus, and a high degree of freedom is obtained in the optical design.

REFERENCES:
patent: 4095891 (1978-06-01), Lovering
patent: 4572659 (1986-02-01), Omata
patent: 4577959 (1986-03-01), Yazaki
patent: 4653903 (1987-03-01), Torigoe et al.

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