Exposure apparatus

Details Exposure apparatus Exposure apparatus

1987-10-02

1989-02-14

Wintercorn, Richard A.

Photocopying

Projection printing and copying cameras

Identifying, composing, or selecting

355 53, G03B 2742, G03B 2752, G03B 2770

Patent

active

048050008

ABSTRACT:
An exposure apparatus for use in manufacturing a semiconductor device which includes a KrF laser as an Excimer laser, a reduction projective type exposure optical system for applying laser beam emitted the laser on a wafer, and a support with vibration absorption function on which the KrF laser is mounted separately from the exposure optical system. The light axis of a light path between the KrF laser and the exposure optical system coincides with direction of vibration which is absorbed in the support.
Thereby, shock wave produced from KrF laser upon discharge operation may be absorbed in said support without giving any bad effect to other components.

REFERENCES:
patent: 4561773 (1985-12-01), Sato
patent: 4595282 (1986-06-01), Takahashi
patent: 4653903 (1987-03-01), Torigoe et al.
patent: 4667109 (1987-05-01), Kano
patent: 4711568 (1987-12-01), Torigoe et al.
patent: 4724466 (1988-02-01), Ogawa et al.

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