Exposure apparatus

Details Exposure apparatus Exposure apparatus

1986-03-10

1989-05-09

Rosenberger, Richard A.

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

356356, 356363, G01B 902

Patent

active

048283924

ABSTRACT:
A reduction projection type alignment and exposure apparatus which comprises a light source, a reticle having a first grating, first lens system, a spatial filter disposed around a Fourier spectral plane of the first lens system, second lens system, a substrate having a second grating, and a plurality of photo-detectors for detecting light intensities of a plurality of spectrums appearing on the spatial filter.
The light beam generated from the light source is applied to the reticle at which it is divided into a plurality of diffracted light beams by the first grating, and the diffracted light beams are applied through the first lens system, the spatial filter and the second lens system onto the substrate so that the diffracted light beams are re-diffracted by the second grating, and the re-diffracted light beams appear as a plurality of spectrums on the spatial filter. These spectrums are detected by photo-detectors and used for alignment of the reticle and the substrate.

REFERENCES:
patent: 3796497 (1974-03-01), Mathisen et al.
patent: 3836257 (1974-09-01), Matsumoto
patent: 4251129 (1981-02-01), Suzki et al.
patent: 4371264 (1983-02-01), Lacombat et al.
patent: 4423959 (1984-01-01), Nakazawa et al.
patent: 4566795 (1986-01-01), Matsura et al.
patent: 4631416 (1986-12-01), Trutna
patent: 4636077 (1987-01-01), Nomura et al.
patent: 4636626 (1987-01-01), Hazama et al.
patent: 4668089 (1987-05-01), Oshida et al.

Affiliated with

Also associated with

Rating

Exposure apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-86219