Exposure apparatus

Details Exposure apparatus Exposure apparatus

1996-01-16

2000-12-05

Epps, Georgia

Optical: systems and elements

Lens

With reflecting element

359663, 359732, 355 53, G02B 1700, G02B 1322, G03B 2742

Patent

active

06157497&

ABSTRACT:
It is an object to provide a high-performance and compact exposure apparatus which can perform a projection exposure operation with satisfactory optical performance by using a plurality of compact projection optical systems each capable of ensuring a sufficient working distance and having excellent imaging performance, while preventing a decrease in throughput even in a large exposure area. An exposure apparatus for projecting and exposing an image of a mask onto a plate while moving a mask and a plate has a first projection optical system and a second projection optical system each of which is real-size and both-side telecentric and forms the erect image of the mask on the plate. The first or second projection optical system has a refraction optical system having a positive refracting power, and a concave reflecting mirror for reflecting a light beam from the refraction optical system toward the refraction optical system.

REFERENCES:
patent: 2742817 (1956-04-01), Altmau
patent: 3819265 (1974-06-01), Feldman et al.
patent: 3910684 (1975-10-01), Glatzel
patent: 4068947 (1978-01-01), Buckley et al.
patent: 4103989 (1978-08-01), Rosin
patent: 4103990 (1978-08-01), Yamada
patent: 4171871 (1979-10-01), Dill et al.
patent: 4391494 (1983-07-01), Hershel
patent: 4425037 (1984-01-01), Hershel et al.
patent: 4469414 (1984-09-01), Shafer
patent: 4512641 (1985-04-01), Mochizuki et al.
patent: 4814830 (1989-03-01), Isohata et al.
patent: 4844568 (1989-07-01), Suzuki et al.
patent: 4924257 (1990-05-01), Jain
patent: 4953960 (1990-09-01), Williamson
patent: 5031977 (1991-07-01), Gibson
patent: 5159172 (1992-10-01), Goodman et al.
patent: 5291240 (1994-03-01), Jain
patent: 5298939 (1994-03-01), Swanson et al.
patent: 5323263 (1994-06-01), Schoenmakers
patent: 5369521 (1994-11-01), Yoshino
patent: 5448416 (1995-09-01), Okumura et al.
patent: 5559629 (1996-09-01), Sheets et al.
patent: 5585972 (1996-12-01), Markle
patent: 5614988 (1997-03-01), Kato et al.
patent: 5617211 (1997-04-01), Nara et al.
patent: 5729331 (1998-03-01), Tanaka et al.
patent: 5805356 (1998-09-01), Chiba
U.S. application No. 07/564,007, filed Aug. 7, 1990, Assignee: Nikon Corp.
English Abstract of JP 07 326 557, Dec. 12, 1995.

Affiliated with

Also associated with

Rating

Exposure apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-966681