Exposure apparatus

Details Exposure apparatus Exposure apparatus

1982-07-26

1985-06-04

Punter, William H.

Optics: measuring and testing

Range or remote distance finding

With photodetection

350403, 356400, G02F 101

Patent

active

045210829

ABSTRACT:
An exposure apparatus includes a reticle provided with at least one mark, and operates on a wafer provided with at least one mark. The apparatus further includes a projection optical system for optically conjugately relating the reticle to the wafer, a mark detecting apparatus for detecting the mark of the reticle and detecting the mark of the wafer through the projection optical system, an illuminator for illuminating the wafer with a sensitizing light, and a phase converting element fixed between the wafer and the reticle for varying the direction of polarization of a light coming from the mark provided on the wafer.

REFERENCES:
patent: 4052603 (1977-10-01), Karlson
patent: 4153371 (1979-05-01), Koizumi et al.
patent: 4406546 (1983-09-01), Suzuki
Bennett et al., "Polarization", Sec. 10 of Handbook of Optics, McGraw Hill, 1978, Driscoll et al. Editors, pp. 10-102 through 10-115.

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