Exposure apparatus

Details Exposure apparatus Exposure apparatus

1988-10-28

1990-10-23

Haroian, Harry N.

Optics: image projectors

Miscellaneous

G03B 2100

Patent

active

049647202

ABSTRACT:
An exposure apparatus for exposing a wafer to a pattern of a mask is disclosed. The apparatus includes a metal-vapor laser for supplying light and an optical arrangement for directing, through the mask, the light supplied by the laser to the wafer.

REFERENCES:
patent: 3786366 (1974-01-01), Chimenti et al.
patent: 4619508 (1986-10-01), Shibuya et al.
patent: 4773750 (1988-09-01), Bruning
Bradley, "Coherent Radiation Generation at Short Wavelengths VUV and XUV Pulses", pp. 9-18, 1978.

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