Exposure apparatus

Details Exposure apparatus Exposure apparatus

1984-05-29

1986-03-25

Hix, L. T.

Photocopying

Projection printing and copying cameras

Illumination systems or details

355 53, G03B 2754

Patent

active

045779597

ABSTRACT:
An exposure apparatus comprises a fly eye lens through which the light beam from a light source condensed by a first optical system is supplied to a second optical system which collimates the light to direct it to a work through a mask pattern so that the pattern is printed on the work, the fly eye lens being rotated to uniform the distribution of illuminance so that a clear printed pattern is formed on the work without interference fringes.

REFERENCES:
patent: 3217594 (1965-11-01), Simmon
patent: 4497015 (1985-01-01), Konno et al.
Mimura et al, "Deep-UV Photolithography", Japanese Journal of Applied Physics, vol. 17, No. 3, pp. 541-550 (Mar., 1978).

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