Exposure apparatus

Details Exposure apparatus Exposure apparatus

1990-11-21

1991-11-05

Miller, Stanley D.

Optical: systems and elements

Holographic system or element

Using a hologram as an optical element

353114, 359 40, G02F 113, G03B 2314

Patent

active

050626922

ABSTRACT:
An exposure apparatus for use in fabricating a printed circuit board. A thermally-written liquid-crystal light valve is provided in which a pattern is formed by opaque portions and transparent portions. A writing optical system directs a heating spot light onto the light valve. The light valve and/or the heating spot light is movable, relative to the other. A projecting optical system is arranged which transmits a luminous flux emitted from a light source, through a liquid-crystal layer within the liquid-crystal light valve. The projecting optical system illuminates a subject with the transmitted luminous flux.

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