Exposure apparatus

Details Exposure apparatus Exposure apparatus

2006-12-06

2011-12-13

Glick, Edward (Department: 2882)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S053000

Reexamination Certificate

active

08077288

ABSTRACT:
An exposure apparatus for exposing a pattern of a reticle onto a substrate by scanning the reticle and the substrate via a projection optical system includes an illumination optical system for illuminating the reticle via a slit that has a longitudinal direction corresponding to a direction orthogonal to a scanning direction. The illumination optical system includes a corrector for correcting a slit width at each position in the longitudinal direction of the slit. The corrector is arranged at a position conjugate with the reticle, and includes a first optical filter movable in a direction corresponding to the longitudinal direction of the slit.

REFERENCES:
patent: 6768546 (2004-07-01), Sato
patent: 2003/0002021 (2003-01-01), Sato
patent: 2003/0025890 (2003-02-01), Nishinaga
patent: 2005/0110972 (2005-05-01), Tsuji et al.
patent: 2005/0162628 (2005-07-01), Sano
patent: 2007/0058150 (2007-03-01), Bouman
patent: H09-190969 (1997-07-01), None
Jan Van Schoot et al., CD Uniformity Improvement by Active Scanner Corrections, Proceedings of SPIE, 2002, pp. 304-314, vol. 4691, SPIE.

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